Neutronix/Quintel UL 7000 Mask Aligner

quintel 2
  • 365 nm and 405 nm exposures at approximately 20 mW/cm2
  • 254 nm and 310 nm exposures at approximately 5 mW/cm2
  • Front side and backside alignment
  • Substrate geometries
    • 4" diameter
    • 5" square
    • 6" diameter
    • good versatility on substrate thickness and geometry
  • Mask geometries
    • 5" square
    • 7" square
    • 9" square
    • 1:1 copies of 5" substrate and mask
  • Print submicron features