Oriel UV Exposure Station

photo: oriel uv

The UV exposure station is used to expose photosensitive resist in the mid UV to deep UV range for optical lithography.  It consists of a vacuum chuck designed to hold a 4" diameter substrate and a mask holder for standard 5" x 5" optical masks.


  • Light Source 1000 Watt Hg(Xe) lamp
  • Wavelength range: ~ 220-450 nm
  • Digital timer for exposure control with resolution of 0.1 seconds