AFT 210XP Nanospec
The Nanometrics 210XP is a spectrophotometer used for the determination of resist film thickness on Silicon. It scans through a range of wavelengths and determines the thickness of the film based on the reflectance of the light.
- Wavelength range: ~ 370 - 800 nm
- Measurable thickness range: ~ 100 A - 50 um
- Typical films measured: oxide, nitride, polysilicon, positive and negative resists, thick and thin films, and polyimide
- Substrate: Silicon