XRLM 2 Beamline (Port 2B)

Operated by Institute for Micromanufacturing (IfM, LaTech University) and the Center for Advanced Microstructures & Devices (CAMD, Louisiana State University).

Characteristics:

  • 'White' spectrum, no optics, 2 Beryllium windows, 1st window, 250 µm thick, 2nd window 150 µm thick
  • transmitted bandpass spectrum: 2.6 keV – 7 keV (10 keV @ 1.45 GeV)
  • vertically integrated power incident on to the mask (100 mA): 226 mW/mrad @ 1.3 GeV, 577 mW/mrad @ 1.45 GeV
  • source to exposure plane distance: 10.7 m.
  • horizontal acceptance: 9.5 milliradians
  • horizontal beam width at the exposure plane: 102 mm.

Scanner and Filter

  • Filters:
    • Currently the following filters can be used:
      Filter 1:         40.0 µm Graphite
      Filter 2:         42.0 µm Graphite
      Filter 3:           6.8 µm Al
      Filter 5:           6.5 µm Al


      Al:             ρ= 2.70 g/ccm
      Graphite:   ρ= 2.25 g/ccm

  • Scanner: X-ray scanner from Jenoptik GmbH

    • maximum length of vertical scan is 100 mm.
      maximum velocity is 50 mm/s
      mask formats are 5" standard NIST, modified NIST, large format, and 4" stainless steel ring
      Substrate: standard 4" wafer and any dimension not larger than 4.75"

Photo BPM

A photon BPM is installed in the front end section and provides actual information of the position of the photon beam during exposure.

Power Flux Spectra of XRLM2 Beamline

xrlm2 spectra

Option

For temporary experiments other setups can be inserted into an approx. 1 m long section behind the 1st beryllium window. Experiments can be operated either in air or connect to the beryllium window with a CF 8" flange. Installation of these experiments is dependent upon exposure needs at the scanner and will be granted upon approval.

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Personnel

Beamline Manager

Dawit Yemane
CAMD
225-578-4618

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