XRLM 2 Beamline (Port 2B)

Operated by Institute for Micromanufacturing (IfM, LaTech University) and the Center for Advanced Microstructures & Devices (CAMD, Louisiana State University).

Characteristics:

  • 'White' spectrum, no optics, 2 Beryllium windows, 1st window, 250 µm thick, 2nd window 150 µm thick
  • transmitted bandpass spectrum: 2.6 keV – 7 keV (10 keV @ 1.45 GeV)
  • vertically integrated power incident on to the mask (100 mA): 226 mW/mrad @ 1.3 GeV, 577 mW/mrad @ 1.45 GeV
  • source to exposure plane distance: 10.7 m.
  • horizontal acceptance: 9.5 milliradians
  • horizontal beam width at the exposure plane: 102 mm.

Scanner and Filter

  • Filters:
    • Currently the following filters can be used:
      Filter 1:         40.0 µm Graphite
      Filter 2:         42.0 µm Graphite
      Filter 3:           6.8 µm Al
      Filter 5:           6.5 µm Al


      Al:             ρ= 2.70 g/ccm
      Graphite:   ρ= 2.25 g/ccm

  • Scanner: X-ray scanner from Jenoptik GmbH

    • maximum length of vertical scan is 100 mm.
      maximum velocity is 50 mm/s
      mask formats are 5" standard NIST, modified NIST, large format, and 4" stainless steel ring
      Substrate: standard 4" wafer and any dimension not larger than 4.75"

Photo BPM

A photon BPM is installed in the front end section and provides actual information of the position of the photon beam during exposure.

Power Flux Spectra of XRLM2 Beamline

photo: xrlm2 spectra

Option

For temporary experiments other setups can be inserted into an approx. 1 m long section behind the 1st beryllium window. Experiments can be operated either in air or connect to the beryllium window with a CF 8" flange. Installation of these experiments is dependent upon exposure needs at the scanner and will be granted upon approval.

 

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Personnel

Beamline Manager

Dawit Yemane
CAMD
225-578-4618

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